9.1% efficient zinc oxide/silicon solar cells on a 50 μm thick Si absorber

• Rafal Pietruszka,
• Bartlomiej S. Witkowski,
• Monika Ozga,
• Katarzyna Gwozdz,
• Ewa Placzek-Popko and
• Marek Godlewski

Beilstein J. Nanotechnol. 2021, 12, 766–774, doi:10.3762/bjnano.12.60

• research groups. This technology was invented in the 1970s by Tuomo Suntola from Finland [4]. Thanks to the unique properties of this technology, materials produced by ALD quickly found a number of applications in PV. For example, ultrathin films of aluminium oxide (Al2O3) are used to passivate silicon

Increasing the stability of DNA nanostructure templates by atomic layer deposition of Al₂O₃ and its application in imprinting lithography

• Hyojeong Kim,
• Kristin Arbutina,
• Anqin Xu and
• Haitao Liu

Beilstein J. Nanotechnol. 2017, 8, 2363–2375, doi:10.3762/bjnano.8.236

• resistive to UV/O3 oxidation. The ALD-coated DNA templates were used for a direct pattern transfer to poly(L-lactic acid) films. Keywords: aluminium oxide (Al2O3); atomic layer deposition; DNA nanostructure; nanofabrication; nanoimprint lithography; pattern transfer; polymer stamp; replica molding

Influence of the diameter of single-walled carbon nanotube bundles on the optoelectronic performance of dry-deposited thin films

• Kimmo Mustonen,
• Toma Susi,
• Antti Kaskela,
• Patrik Laiho,
• Ying Tian,
• Albert G. Nasibulin and
• Esko I. Kauppinen

Beilstein J. Nanotechnol. 2012, 3, 692–702, doi:10.3762/bjnano.3.79

• produced by vaporization from a resistively heated iron wire (current 2.7 A, diameter 250 μm, purity 99.95%, Goodfellow, USA) in a H2/Ar (7/93 mol ratio) flow of 480 cm3·min−1 inside an aluminium oxide (Al2O3) tube (inner diameter 16 mm). Particles formed and grew through vapor nucleation–condensation and